Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by Nanoimprint Lithography.

ABSTRACT: The self-assembly of a lamellar-forming polystyrene-block-poly(dimethylsiloxane) (PS-b-PDMS) diblock copolymer (DBCP) was studied herein for surface nanopatterning. The DBCP was synthesized by sequential living anionic polymerization of styrene and hexamethylcyclotrisiloxane (D₃). The number average molecular weight (M_n), polydispersity index (M_w/M_n) and PS volume fraction (φ_ps) of the DBCP were M_n^PS = 23.0 kg mol^-1, M_n^PDMS = 15.0 kg mol^-1, M_w/M_n = 1.06 and φ_ps = 0.6. Thin films of the DBCP were cast and solvent annealed on topographically patterned polyhedral oligomeric silsesquioxane (

SUBMITTER: Borah D 

PROVIDER: S-EPMC5791119 | biostudies-literature | 2018 Jan

REPOSITORIES: biostudies-literature