Interfacial Strength and Surface Damage Characteristics of Atomically Thin h-BN, MoS₂, and Graphene.

ABSTRACT: Surface damage characteristics of single- and multilayer hexagonal boron nitride (h-BN), molybdenum disulfide (MoS₂), and graphene films were systematically investigated via atomic force microscopy (AFM)-based progressive-force and constant-force scratch tests and Raman spectroscopy. The film-to-substrate interfacial strengths of these atomically thin films were assessed based on their critical forces (i.e., the normal force where the atomically thin film was delaminated from the underlying substrate), as determined from progressive-force scratch tests. The evolution of surface damage with respect to normal force was further investigated using constant-force tests. The results showed that single-layer h-BN, MoS₂, and graphene strongly adhere to the SiO₂ sub

SUBMITTER: Tran Khac BC 

PROVIDER: S-EPMC5969908 | biostudies-literature | 2018 Mar

REPOSITORIES: biostudies-literature