Deep-UV photoinduced chemical patterning at the micro- and nanoscale for directed self-assembly.

ABSTRACT: Deep-UV (DUV) laser patterning has been widely used in recent years for micro- and nanopatterning, taking advantage of the specific properties of irradiation with high-energy photons. In this paper, we show the usefulness of DUV laser patterning for preparing surfaces with controlled chemical properties at the micro- and nanoscale. Our motivation was to develop a simple and versatile method for chemical patterning at multiscales (from mm to nm) over relatively wide areas (mm² to cm²). The chemical properties were provided by self-assembled monolayers (SAMs), prepared on glass or silicon wafers. We first investigated their modification under our irradiation conditions (ArF laser) using AFM, XPS and contact angle measurements. Photopatterning was then demonstrated with

SUBMITTER: Leuschel B 

PROVIDER: S-EPMC6041335 | biostudies-literature | 2018 Jul

REPOSITORIES: biostudies-literature