Optically controlled magnetic-field etching on the nano-scale.

ABSTRACT: Electric and magnetic fields play an important role in both chemical and physical reactions. However, since the coupling efficiency between magnetic fields and electrons is low in comparison with that between electric fields and electrons in the visible wavelength region, the magnetic field is negligible in photo-induced reactions. Here, we performed photo-etching of ZrO₂ nano-stripe structures, and identified an etching-property polarisation dependence. Specifically, the etching rate and etched profiles depend on the structure width. To evaluate this polarisation-dependent etching, we performed numerical calculations using a finite-difference time-domain method. Remarkably, the numerical results revealed that the polarisation-dependent etching properties were determined by the

SUBMITTER: Yatsui T 

PROVIDER: S-EPMC6059895 | biostudies-literature | 2016 Mar

REPOSITORIES: biostudies-literature