Susceptibility of Escherichia coli O157:H7 grown at low temperatures to the krypton-chlorine excilamp.

ABSTRACT: This study was conducted to investigate the resistance of Escherichia coli O157:H7 to 222-nm krypton-chlorine(KrCl) excilamp and 254-nm low-pressure Hg lamp (LP lamp) treatment according to growth temperature. As growth temperature decreased, lag time of E. coli O157:H7 significantly increased while the growth rate significantly decreased. Regardless of growth temperature, the KrCl excilamp showed higher disinfection capacity compared to the LP lamp at stationary growth phase. KrCl excilamp treatment showed significantly higher reduction as growth temperature decreased. Conversely, reduction levels according to growth temperature were not significantly different when the pathogen was subjected to LP lamp treatment. Inactivation mechanisms were evaluated by the thiobarbituric acid reactive

SUBMITTER: Lee JI 

PROVIDER: S-EPMC6346039 | biostudies-literature | 2019 Jan

REPOSITORIES: biostudies-literature