Determination of the vapour pressure curves and vaporization enthalpies of hafnium alkoxides using thermogravimetric analysis.

ABSTRACT: In order to identify a volatile metallo-organic precursor for the deposition of hafnium oxide (HfO₂) films for atomic layer deposition (ALD) applications, the evaporative properties of hafnium alkoxides (hafnium isopropoxide, hafnium n-propoxide and hafnium n-butoxide) were investigated using thermogravimetric analysis. These hafnium alkoxide samples were synthesized by the electrochemical method and characterized by Fourier transform infrared spectroscopy, nuclear magnetic resonance and inductively coupled plasma analysis techniques. The characterization results indicated that the products were 99.997% high-purity hafnium alkoxides and could meet the requirement of purity considering the usage of making HfO₂ gate oxide by ALD. Synthesized samples were s

SUBMITTER: Wang C 

PROVIDER: S-EPMC6366183 | biostudies-literature | 2019 Jan

REPOSITORIES: biostudies-literature