Ligand-induced reduction concerted with coating by atomic layer deposition on the example of TiO2-coated magnetite nanoparticles.

ABSTRACT: Atomic layer deposition is a chemical deposition technology that provides ultimate control over the conformality of films and their thickness, even down to Ångström-scale precision. Based on the marked superficial character and gas phase process of the technique, metal sources and their ligands shall ideally be highly volatile. However, in numerous cases those ligands corrode the substrate or compete for adsorption sites, well-known as side reactions of these processes. Therefore, the ability to control such side reactions might be of great interest, since it could achieve synchronous coating and alteration of a substrate in one process, saving time and energy otherwise needed for a post-treatment of the sample. Consequently, advances in this way must require understanding and control of t

SUBMITTER: Garcia-Garcia S 

PROVIDER: S-EPMC6385483 | biostudies-literature | 2019 Feb

REPOSITORIES: biostudies-literature