Scalable fabrication of microneedle arrays via spatially controlled UV exposure.

ABSTRACT: This paper describes a theoretical estimation of the geometry of negative epoxy-resist microneedles prepared via inclined/rotated ultraviolet (UV) lithography based on spatially controlled UV exposure doses. In comparison with other methods based on UV lithography, the present method can create microneedle structures with high scalability. When negative photoresist is exposed to inclined/rotated UV through circular mask patterns, a three-dimensional, needle-shaped distribution of the exposure dose forms in the irradiated region. Controlling the inclination angles and the exposure dose modifies the photo-polymerized portion of the photoresist, thus allowing the variation of the heights and contours of microneedles formed by using the same mask patterns. In an experimental study, the dimensi

SUBMITTER: Takahashi H 

PROVIDER: S-EPMC6444715 | biostudies-literature | 2016

REPOSITORIES: biostudies-literature