Enhanced activity of highly conformal and layered tin sulfide (SnS_x) prepared by atomic layer deposition (ALD) on 3D metal scaffold towards high performance supercapacitor electrode.

ABSTRACT: Layered Sn-based chalcogenides and heterostructures are widely used in batteries and photocatalysis, but its utilizations in a supercapacitor is limited by its structural instability and low conductivity. Here, SnS_x thin films are directly and conformally deposited on a three-dimensional (3D) Ni-foam (NF) substrate by atomic layer deposition (ALD), using tetrakis(dimethylamino)tin [TDMASn, ((CH₃)₂N)₄Sn] and H₂S that serves as an electrode for supercapacitor without any additional treatment. Two kinds of ALD-SnS_x films grown at 160 °C and 180 °C are investigated systematically by X-ray diffractometry, Raman spectroscopy, X-ray photoelectron spectroscopy, and transmission electron microscopy (TEM). All of the characterization

SUBMITTER: Ansari MZ 

PROVIDER: S-EPMC6629880 | biostudies-literature | 2019 Jul

REPOSITORIES: biostudies-literature