Chemically Stable Atomic-Layer-Deposited Al₂O₃ Films for Processability.

ABSTRACT: Atomic-layer-deposited alumina (ALD Al₂O₃) can be utilized for passivation, structural, and functional purposes in electronics. In all cases, the deposited film is usually expected to maintain chemical stability over the lifetime of the device or during processing. However, as-deposited ALD Al₂O₃ is typically amorphous with poor resistance to chemical attack by aggressive solutions employed in electronics manufacturing. Therefore, such films may not be suitable for further processing as solvent treatments could weaken the protective barrier properties of the film or dissolved material could contaminate the solvent baths, which can cause cross-contamination of a production line used to manufacture different products. On the contrary, heat-treated,

SUBMITTER: Broas M 

PROVIDER: S-EPMC6641164 | biostudies-literature | 2017 Jul

REPOSITORIES: biostudies-literature