Hierarchically Patterned Elastomeric and Thermoplastic Polymer Films through Nanoimprinting and Ultraviolet Light Exposure.

ABSTRACT: The surface relief structure of polymer films over large areas can be controlled by combining nanoscale imprinting and microscale ultraviolet-ozone (UVO) radiation, resulting in hierarchical structured surfaces. First, nanoscale patterns were formed by nanoimprinting elastomer [poly(dimethylsiloxane) (PDMS)] films with a pattern on a digital video disk. Micron-scale patterns were then superimposed on the nanoimprinted PDMS films by exposing them to ultraviolet radiation in oxygen (UVO) through a transmission electron microscopy grid mask having variable microscale patterning. UVO exposure leads to conversion and densification of PDMS to SiO _x , leading to micron height relief features that follow a linear scaling relation with pattern dimension. Further, the pattern scope

SUBMITTER: Chen Y 

PROVIDER: S-EPMC6643988 | biostudies-literature | 2018 Nov

REPOSITORIES: biostudies-literature