Self-Organization of Triblock Copolymer Melt Chains Physisorbed on Non-neutral Surfaces.

ABSTRACT: We here report the self-organization process of poly(styrene-b-ethylene/butadiene-b-styrene) (SEBS) triblock copolymer chains physically adsorbed on a non-neutral surface. Spin-cast SEBS thin films were prepared on silicon (Si) substrates and then annealed at a high temperature far above the bulk glass transition temperatures of the two constituent blocks. To reveal the buried interfacial structure, we utilized solvent rinsing processes and a suite of surface-sensitive techniques including ellipsometry, X-ray reflectivity, atomic force microscopy, and grazing incidence small angle X-ray scattering. We revealed that the SEBS chains form two different chain structures on the substrate simultaneously: (i) "flattened chains" with the average height of 2.5 nm but without forming m

SUBMITTER: Jiang N 

PROVIDER: S-EPMC6644122 | biostudies-literature | 2018 Dec

REPOSITORIES: biostudies-literature