Atomic Layer Deposition of Nickel Using a Heteroleptic Ni Precursor with NH₃ and Selective Deposition on Defects of Graphene.

ABSTRACT: Atomic layer deposition (ALD) of Ni was demonstrated by introducing a novel oxygen-free heteroleptic Ni precursor, (η³-cyclohexenyl)(η⁵-cyclopentadienyl)nickel(II) [Ni(Chex)(Cp)]. For this process, non-oxygen-containing reactants (NH₃ and H₂ molecules) were used within a deposition temperature range of 320-340 °C. Typical ALD growth behavior was confirmed at 340 °C with a self-limiting growth rate of 1.1 Å/cycle. Furthermore, a postannealing process was carried out in a H₂ ambient environment to improve the quality of the as-deposited Ni film. As a result, a high-quality Ni film with a substantially low resistivity (44.9 μΩcm) was obtained, owing to the high purity and excellent crystallinity. Finally, this Ni ALD process was also perf

SUBMITTER: Kim M 

PROVIDER: S-EPMC6648170 | biostudies-literature | 2019 Jun

REPOSITORIES: biostudies-literature