Edge-Site Nanoengineering of WS₂ by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution.

ABSTRACT: Edge-enriched transition metal dichalcogenides, such as WS₂, are promising electrocatalysts for sustainable production of H₂ through the electrochemical hydrogen evolution reaction (HER). The reliable and controlled growth of such edge-enriched electrocatalysts at low temperatures has, however, remained elusive. In this work, we demonstrate how plasma-enhanced atomic layer deposition (PEALD) can be used as a new approach to nanoengineer and enhance the HER performance of WS₂ by maximizing the density of reactive edge sites at a low temperature of 300 °C. By altering the plasma gas composition from H₂S to H₂ + H₂S during PEALD, we could precisely control the morphology and composition and, consequently, the edge-site density

SUBMITTER: Balasubramanyam S 

PROVIDER: S-EPMC6662884 | biostudies-literature | 2019 Jul

REPOSITORIES: biostudies-literature