Direct Patterning of a Carbon Nanotube Thin Layer on a Stretchable Substrate.

ABSTRACT: Solution-based direct patterning on an elastomer substrate with meniscus-dragging deposition (MDD) enables fabrication of very thin carbon nanotube (CNT) layers in the nanometer scale (80-330 nm). To fabricate the CNT pattern with CNT solution, contact angle, electrical variation, mechanical stress, and surface cracks of elastomer substrate were analyzed to identify the optimal conditions of O2 treatment (treatment for 30 s with RF power of 50 W in O2 atmosphere of 50 sccm) and mixture ratio between Ecoflex and polydimethylsiloxane (PDMS) (Ecoflex:PDMS = 5:1). The type of mask for patterning of the CNT layer was determined through quantitative analysis for sharpness and uniformity of the fabricated CNT pattern. Through these optimization processes, the CNT pattern was produced on the elast

SUBMITTER: Lee E 

PROVIDER: S-EPMC6722655 | biostudies-literature | 2019 Aug

REPOSITORIES: biostudies-literature