Metasurface-generated complex 3-dimensional optical fields for interference lithography.

ABSTRACT: Fast, large-scale, and robust 3-dimensional (3D) fabrication techniques for patterning a variety of structures with submicrometer resolution are important in many areas of science and technology such as photonics, electronics, and mechanics with a wide range of applications from tissue engineering to nanoarchitected materials. From several promising 3D manufacturing techniques for realizing different classes of structures suitable for various applications, interference lithography with diffractive masks stands out for its potential to fabricate complex structures at fast speeds. However, the interference lithography masks demonstrated generally suffer from limitations in terms of the patterns that can be generated. To overcome some of these limitations, here we propose the metasurface-mask

SUBMITTER: Kamali SM 

PROVIDER: S-EPMC6815187 | biostudies-literature | 2019 Oct

REPOSITORIES: biostudies-literature