Pulsed Laser Deposition of Bismuth Vanadate Thin Films-The Effect of Oxygen Pressure on the Morphology, Composition, and Photoelectrochemical Performance.

ABSTRACT: Thin layers of bismuth vanadate were deposited using the pulsed laser deposition technique on commercially available FTO (fluorine-doped tin oxide) substrates. Films were sputtered from a sintered, monoclinic BiVO4 pellet, acting as the target, under various oxygen pressures (from 0.1 to 2 mbar), while the laser beam was perpendicular to the target surface and parallel to the FTO substrate. The oxygen pressure strongly affects the morphology and the composition of films observed as a Bi:V ratio gradient along the layer deposited on the substrate. Despite BiVO4, two other phases were detected using XRD (X-ray diffraction) and Raman spectroscopy-V2O5 and Bi4V2O11. The V-rich region of the samples deposited under low and intermediate oxygen pressures was covered by V2O5 longitudinal structure

SUBMITTER: Trzcinski K 

PROVIDER: S-EPMC7143622 | biostudies-literature | 2020 Mar

REPOSITORIES: biostudies-literature