PECVD of Hexamethyldisiloxane Coatings Using Extremely Asymmetric Capacitive RF Discharge.

ABSTRACT: An extremely asymmetric low-pressure discharge was used to study the composition of thin films prepared by PECVD using HMDSO as a precursor. The metallic chamber was grounded, while the powered electrode was connected to an RF generator. The ratio between the surface area of the powered and grounded electrode was about 0.03. Plasma and thin films were characterised by optical spectroscopy and XPS depth profiling, respectively. Dense luminous plasma expanded about 1 cm from the powered electrode while a visually uniform diffusing plasma of low luminosity occupied the entire volume of the discharge chamber. Experiments were performed at HMDSO partial pressure of 10 Pa and various oxygen partial pressures. At low discharge power and small oxygen concentration, a rather uniform film was deposi

SUBMITTER: Gosar Z 

PROVIDER: S-EPMC7254392 | biostudies-literature | 2020 May

REPOSITORIES: biostudies-literature