Iron-Intercalated Zirconium Diselenide Thin Films from the Low-Pressure Chemical Vapor Deposition of [Fe(η⁵-C₅H₄Se)₂Zr(η⁵-C₅H₅)₂]₂.

ABSTRACT: Transition metal chalcogenide thin films of the type Fe _x ZrSe₂ have applications in electronic devices, but their use is limited by current synthetic techniques. Here, we demonstrate the synthesis and characterization of Fe-intercalated ZrSe₂ thin films on quartz substrates using the low-pressure chemical vapor deposition of the single-source precursor [Fe(η⁵-C₅H₄Se)₂Zr(η⁵-C₅H₅)₂]₂. Powder X-ray diffraction of the film scraping and subsequent Rietveld refinement of the data showed the successful synthesis of the Fe_0.14ZrSe₂ phase, along with secondary phases of FeSe and ZrO₂. Upon intercalation, a small optical band gap

SUBMITTER: Sanchez-Perez C 

PROVIDER: S-EPMC7345377 | biostudies-literature | 2020 Jul

REPOSITORIES: biostudies-literature