Experimental setup for high-temperature in situ studies of crystallization of thin films with atmosphere control.

ABSTRACT: Understanding the crystallization process for chemical solution deposition (CSD) processed thin films is key in designing the fabrication strategy for obtaining high-quality devices. Here, an in situ sample environment is presented for studying the crystallization of CSD processed thin films under typical processing parameters using near-grazing-incidence synchrotron X-ray diffraction. Typically, the pyrolysis is performed in a rapid thermal processing (RTP) unit, where high heating rates, high temperatures and atmosphere control are the main control parameters. The presented in situ setup can reach heating rates of 20°C s^-1 and sample surface temperatures of 1000°C, comparable with commercial RTP units. Three examples for lead-free ferroelectric thin films are presented to show

SUBMITTER: Blichfeld AB 

PROVIDER: S-EPMC7467347 | biostudies-literature | 2020 Sep

REPOSITORIES: biostudies-literature