Nonthermal Plasma-Enhanced Chemical Vapor Deposition of Two-Dimensional Molybdenum Disulfide.

ABSTRACT: Molybdenum disulfide (MoS₂) is being studied for a wide range of applications including lithium-ion batteries and hydrogen evolution reaction catalysts. In this paper, we present a single-step nonthermal plasma-enhanced chemical vapor deposition (PECVD) process for the production of two-dimensional MoS₂. This method provides an alternative route to established CVD and plasma synthesis routes. The approach presented here synthesizes films in only a few minutes using elemental sulfur (S₈) and molybdenum pentachloride (MoCl₅) as precursors. Deposition utilizes a nonthermal inductively coupled plasma reactor and temperatures around 500 °C. Film growth characteristics and nucleation are studied as a function of precursor concentrations, argon flow rat

SUBMITTER: Beaudette CA 

PROVIDER: S-EPMC7469405 | biostudies-literature | 2020 Sep

REPOSITORIES: biostudies-literature