Fused Metalloporphyrin Thin Film with Tunable Porosity via Chemical Vapor Deposition.

ABSTRACT: Porous and highly conjugated multiply fused porphyrin thin films are prepared from a fast and single-step chemical vapor deposition approach. While the solution-based coupling of porphyrins is usually undertaken at room temperature, the gas phase reaction of nickel(II) 5,15-(diphenyl)porphyrin and iron(III) chloride (FeCl₃) is investigated for temperatures as high as 200 °C. Helium ion and atomic force microscopy, supported by weight and thickness measurements, shows a drastic decrease of the fused porphyrin thin film's density accompanied by the formation of a mesoporous morphology upon increase of the reaction temperature. The increase of the film's porosity is attributed to formation of a greater amount of HCl (originated from both the oxidative coupling and chlorination reac

SUBMITTER: Baba K 

PROVIDER: S-EPMC7472432 | biostudies-literature | 2020 Aug

REPOSITORIES: biostudies-literature