Design of CMOS-compatible metal-insulator-metal metasurfaces via extended equivalent-circuit analysis.

ABSTRACT: Photonic metasurfaces compatible with large-scale production such as CMOS are of importance because they promise cointegration of electronics with photonics for detection, communication and sensing. The main challenges on the way of designing such metasurfaces are: (1) large variety of possible geometrical shapes of metasurface elements that makes finding the most appropriate shape difficult; (2) poor compatibility of available electronic layer stacks with photonics. In this paper we show how to address both of these challenges utilizing extended equivalent-circuit analysis. In a first step we classify the behavior of different metasurfaces using the equivalent circuit. We discover that metasurfaces that use inverted-dipole resonator type exhibit higher tolerance to dielectric spacer thick

SUBMITTER: Dorodnyy A 

PROVIDER: S-EPMC7578050 | biostudies-literature | 2020 Oct

REPOSITORIES: biostudies-literature