Fabrication of Tapered 3D Microstructure Arrays Using Dual-Exposure Lithography (DEL).

ABSTRACT: Three-dimensional (3D) microstructure arrays (MSAs) have been widely used in material science and biomedical applications by providing superhydrophobic surfaces, cell-interactive topography, and optical diffraction. These properties are tunable through the engineering of microstructure shapes, dimensions, tapering, and aspect ratios. However, the current fabrication methods are often too complex, expensive, or low-throughput. Here, we present a cost-effective approach to fabricating tapered 3D MSAs using dual-exposure lithography (DEL) and soft lithography. DEL used a strip-patterned film mask to expose the SU-8 photoresist twice. The mask was re-oriented between exposures (90° or 45°), forming an array of dual-exposed areas. The intensity distribution from both exposures overlapped and cr

SUBMITTER: Rengarajan V 

PROVIDER: S-EPMC7599893 | biostudies-literature | 2020 Sep

REPOSITORIES: biostudies-literature