Reactive Plasma N-Doping of Amorphous Carbon Electrodes: Decoupling Disorder and Chemical Effects on Capacitive and Electrocatalytic Performance.

ABSTRACT: Nitrogen-free amorphous carbon thin films prepared via sputtering followed by graphitization, were used as precursor materials for the creation of N-doped carbon electrodes with varying degrees of amorphization. Incorporation of N-sites was achieved via nitrogen plasma treatments which resulted in both surface functionalization and amorphization of the carbon electrode materials. X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy were used to monitor composition and carbon organization: results indicate incorporation of predominantly pyrrolic-N sites after relatively short treatment cycles (5 min or less), accompanied by an initial etching of amorphous regions followed by a slower process of amorphization of graphitized clusters. By leveraging the difference in the rate of these

SUBMITTER: Hoque MK 

PROVIDER: S-EPMC7670066 | biostudies-literature | 2020

REPOSITORIES: biostudies-literature