Atmospheric Pressure Catalytic Vapor Deposition of Graphene on Liquid Sn and Cu-Sn Alloy Substrates.

ABSTRACT: The chemical vapor deposition (CVD) of graphene on liquid substrates produces high quality graphene films due to the defect-free and atomically flat surfaces of the liquids. Through the detailed study of graphene growth on liquid Sn using atmospheric pressure CVD (APCVD), the quality of graphene has been found to have a close relationship with hydrogen flow rate that reflects on hydrogen partial pressure inside the reactor (PH2) and hydrogen solubility of the growth substrates. The role of PH2 was found to be crucial, with a low defect density monolayer graphene being obtained in low PH2 (90.4 mbar), while partial graphene coverage occurred at high PH2 (137.3 mbar). To further understand the role of substrate's composition, binary alloy with compositions of 20, 30, 50, 60 and 80 wt.% tin i

SUBMITTER: Saeed MA 

PROVIDER: S-EPMC7692589 | biostudies-literature | 2020 Oct

REPOSITORIES: biostudies-literature