Atomic Layer Deposition (ALD) of Alumina over Activated Carbon Electrodes Enabling a Stable 4 V Supercapacitor Operation.

ABSTRACT: Designing high voltage (>3 V) and stable electrochemical supercapacitors with low self-discharge is desirable for the applications in modern electronic devices. This work demonstrates a 4 V symmetric supercapacitor with stabilized cycling performance through atomic layer deposition (ALD) of alumina (Al₂ O₃ ) on the surface of activated carbon (AC). The 20-cycle ALD Al₂ O₃ coated AC delivers 84 % capacitance retention after 1000 charge/discharge cycles under 4 V, contrary to the bare AC cells having only 48 % retention. The extended cycling life is associated with the thickened Stern layer and suppressed oxygen functional group. The self-discharge data also show that the Al₂ O₃ coating enables AC cells to maintain 53 % of cha

SUBMITTER: Gandla D 

PROVIDER: S-EPMC8015731 | biostudies-literature | 2021 Apr

REPOSITORIES: biostudies-literature