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Unparalleled Armour for Aramid Fiber with Excellent UV Resistance in Extreme Environment.


ABSTRACT: Aramid fibers are widely used in many cutting-edge fields, including space, aviation, military, and electronics. However, their poor UV resistance and surface inertness seriously hinder their utilization, especially in harsh environments. Here, a dual-layer ultrathin Al2O3-TiO2 coating with a thickness of 70-180 nm is fabricated on aramid fibers by a modified atomic layer deposition (ALD) method. The tenacity of ALD-coated aramid fibers decreases only by ≈0.85% after exposure to intense UV light (4260 W m-2) under high temperature (>200 ℃) for 90 min, which equals to continuous exposure to sunlight for about 17 500 days. The as-prepared aramid fibers also show excellent laundering durability, thermal and chemical stabilities. This work presents a green and damage-free approach to achieve the highly anti-UV aramid fibers without sacrificing their outstanding performance, which is expected to guide material design for future innovations in functional fibers and devices.

SUBMITTER: Chen F 

PROVIDER: S-EPMC8224419 | biostudies-literature | 2021 Jun

REPOSITORIES: biostudies-literature

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Unparalleled Armour for Aramid Fiber with Excellent UV Resistance in Extreme Environment.

Chen Fengxiang F   Zhai Lisha L   Yang Huiyu H   Zhao Shichao S   Wang Zonglei Z   Gao Chong C   Zhou Jingyi J   Liu Xin X   Yu Zhenwei Z   Qin Yong Y   Xu Weilin W  

Advanced science (Weinheim, Baden-Wurttemberg, Germany) 20210506 12


Aramid fibers are widely used in many cutting-edge fields, including space, aviation, military, and electronics. However, their poor UV resistance and surface inertness seriously hinder their utilization, especially in harsh environments. Here, a dual-layer ultrathin Al<sub>2</sub>O<sub>3</sub>-TiO<sub>2</sub> coating with a thickness of 70-180 nm is fabricated on aramid fibers by a modified atomic layer deposition (ALD) method. The tenacity of ALD-coated aramid fibers decreases only by ≈0.85% a  ...[more]

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