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Nanoscale Bilayer Mechanical Lithography Using Water as Developer.

ABSTRACT: Sustainability has become a critical concern in the semiconductor industry as hazardous wastes released during the manufacturing process of semiconductor devices have an adverse impact on human beings and the environment. The use of hazardous solvents in existing fabrication processes also restricts the use of polymer substrates because of their low chemical resistance to such solvents. Here, we demonstrate an environmentally friendly mechanical, bilayer lithography that uses just water for development and lift-off. We show that we are able to create arbitrary patterns achieving resolution down to 310 nm. We then demonstrate the use of this technique to create functional devices by fabricating a MoS₂ photodetector on a polyethylene terephthalate (PET) substrate with measured response times down to 42 ms.

SUBMITTER: Shu Y

PROVIDER: S-EPMC8289280 | biostudies-literature | 2021 May

REPOSITORIES: biostudies-literature

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Nanoscale Bilayer Mechanical Lithography Using Water as Developer.

Shu Yu Y Porter Benjamin F BF Soh Eugene J H EJH Farmakidis Nikolaos N Lim Seongdong S Lu Yang Y Warner Jamie H JH Bhaskaran Harish H

Nano letters 20210422 9

Sustainability has become a critical concern in the semiconductor industry as hazardous wastes released during the manufacturing process of semiconductor devices have an adverse impact on human beings and the environment. The use of hazardous solvents in existing fabrication processes also restricts the use of polymer substrates because of their low chemical resistance to such solvents. Here, we demonstrate an environmentally friendly mechanical, bilayer lithography that uses just water for deve ...[more]

PMID: 33886314

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