Towards Scalable Large-Area Pulsed Laser Deposition.

ABSTRACT: One of the significant limitations of the pulsed laser deposition method in the mass-production-technologies of micro- and nanoelectronic and molecular device electronic fabrication is the issue of ensuring deposition of films with uniform thickness on substrates with large diameter (more than 100 mm) since the area of the laser spot (1-5 mm2) on the surface of the ablated target is incommensurably smaller than the substrate area. This paper reports the methodology that allows to calculate the distribution profile of the film thickness over the surface substrate with a large diameter, taking into account the construction and technological parameters of the pulsed laser deposition equipment. Experimental verification of the proposed methodology showed that the discrepancy with the experimen

SUBMITTER: Vakulov Z 

PROVIDER: S-EPMC8432691 | biostudies-literature | 2021 Aug

REPOSITORIES: biostudies-literature