Introducing Water Electrolithography.

ABSTRACT: High-resolution patterning with remarkable customizability has stimulated the invention of numerous scanning probe lithography (SPL) techniques. However, frequent tip damage, substrate-film deterioration, low throughput, and debris amassing in the patterned region are the inherent impediments that have precluded obtaining patterns with high repeatability using SPL. Hence, SPL still has not got wider acceptance for industrial fabrication and technological applications. Here, we introduce a novel SPL technique, named water electrolithography (W-ELG), for patterning at the microscale and potentially at the nanoscale also. The technique operates in the non-contact mode and is based on the selective etching, via an electrochemical process, of a metallic film (e.g., Cr) submerged into water. Her

SUBMITTER: Kumar S 

PROVIDER: S-EPMC8495873 | biostudies-literature | 2021 Oct

REPOSITORIES: biostudies-literature