Tuning the band gap and carrier concentration of titania films grown by spatial atomic layer deposition: a precursor comparison.

ABSTRACT: Spatial atomic layer deposition retains the advantages of conventional atomic layer deposition: conformal, pinhole-free films and excellent control over thickness. Additionally, it allows higher deposition rates and is well-adapted to depositing metal oxide nanofilms for photovoltaic cells and other devices. This study compares the morphological, electrical and optical properties of titania thin films deposited by spatial atomic layer deposition from titanium isopropoxide (TTIP) and titanium tetrachloride (TiCl₄) over the temperature range 100-300 °C, using the oxidant H₂O. Amorphous films were deposited at temperatures as low as 100 °C from both precursors: the approach is suitable for applying films to temperature-sensitive devices. An amorphous-to-crystalline trans

SUBMITTER: Armstrong C 

PROVIDER: S-EPMC8507900 | biostudies-literature | 2021 Oct

REPOSITORIES: biostudies-literature