Spatiotemporal patterns of gene expression around implanted silicon electrode arrays.
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ABSTRACT: Objective.Intracortical brain interfaces are an ever evolving technology with growing potential for clinical and research applications. The chronic tissue response to these devices traditionally has been characterized by glial scarring, inflammation, oxidative stress, neuronal loss, and blood-brain barrier disruptions. The full complexity of the tissue response to implanted devices is still under investigation.Approach.In this study, we have utilized RNA-sequencing to identify the spatiotemporal gene expression patterns in interfacial (within 100µm) and distal (500µm from implant) brain tissue around implanted silicon microelectrode arrays. Naïve, unimplanted tissue served as a control.Main results.The data revealed significant overall differential expres
SUBMITTER: Thompson CH
PROVIDER: S-EPMC8650570 | biostudies-literature | 2021 Apr
REPOSITORIES: biostudies-literature
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