Photo-oxidative degradation of polyacids derived ceria nanoparticle modulation for chemical mechanical polishing.

ABSTRACT: The effects of photo-oxidative degradation of polyacids at various concentrations and with different durations of ultraviolet (UV) irradiation on the photo-reduction of ceria nanoparticles were investigated. The effect of UV-treated ceria on the performance of chemical mechanical polishing (CMP) for the dielectric layer was also evaluated. When the polyacids were exposed to UV light, they underwent photo-oxidation with consumption of the dissolved oxygen in slurry. UV-treated ceria particles formed oxygen vacancies by absorbing photon energy, resulting in increased Ce³⁺ ions concentration on the surface, and when the oxygen level of the solution was lowered by the photo-oxidation of polymers, the formation of Ce³⁺ ions was promoted from 14.2 to 36.5%. Furthermore, cha

SUBMITTER: Kim E 

PROVIDER: S-EPMC8803865 | biostudies-literature | 2022 Jan

REPOSITORIES: biostudies-literature