Surface Chemistry during Atomic Layer Deposition of Pt Studied with Vibrational Sum-Frequency Generation.

ABSTRACT: A detailed understanding of the growth of noble metals by atomic layer deposition (ALD) is key for various applications of these materials in catalysis and nanoelectronics. The Pt ALD process using MeCpPtMe₃ and O₂ gas as reactants serves as a model system for the ALD processes of noble metals in general. The surface chemistry of this process was studied by in situ vibrational broadband sum-frequency generation (BB-SFG) spectroscopy, and the results are placed in the context of a literature overview of the reaction mechanism. The BB-SFG experiments provided direct evidence for the presence of CH₃ groups on the Pt surface after precursor chemisorption at 250 °C. Strong evidence was found for the presence of a C=C containing complex (e.g., the f

SUBMITTER: Vandalon V 

PROVIDER: S-EPMC8842249 | biostudies-literature | 2022 Feb

REPOSITORIES: biostudies-literature