Spatial modulation of nanopattern dimensions by combining interference lithography and grayscale-patterned secondary exposure.

ABSTRACT: Functional nanostructures are exploited for a variety of cutting-edge fields including plasmonics, metasurfaces, and biosensors, just to name a few. Some applications require nanostructures with uniform feature sizes while others rely on spatially varying morphologies. However, fine manipulation of the feature size over a large area remains a substantial challenge because mainstream approaches to precise nanopatterning are based on low-throughput pixel-by-pixel processing, such as those utilizing focused beams of photons, electrons, or ions. In this work, we provide a solution toward wafer-scale, arbitrary modulation of feature size distribution by introducing a lithographic portfolio combining interference lithography (IL) and grayscale-patterned secondary exposure (SE). Employed after th

SUBMITTER: Gan Z 

PROVIDER: S-EPMC8993805 | biostudies-literature | 2022 Apr

REPOSITORIES: biostudies-literature