ITO film stack engineering for low-loss silicon optical modulators.

ABSTRACT: The Indium Tin Oxide (ITO) platform is one of the promising solutions for state-of-the-art integrated optical modulators towards low-loss silicon photonics applications. One of the key challenges on this way is to optimize ITO-based thin films stacks for electro-optic modulators with both high extinction ratio and low insertion loss. In this paper we demonstrate the e-beam evaporation technology of 20 nm-thick ITO films with low extinction coefficient of 0.14 (N_c = 3.7·10²⁰ cm^-3) at 1550 nm wavelength and wide range of carrier concentrations (from 1 to 10 × 10²⁰ cm^-3). We investigate ITO films with amorphous, heterogeneously crystalline, homogeneously crystalline with hidden coarse grains and pronounced coarsely crystalline structure t

SUBMITTER: Lotkov ES 

PROVIDER: S-EPMC9012746 | biostudies-literature | 2022 Apr

REPOSITORIES: biostudies-literature