Patterning 2D materials for devices by mild lithography.

ABSTRACT: 2D materials have been intensively studied for almost two decades and are now exhibiting exceptional properties. Thus, devices that integrate 2D materials offer many novel functionalities that will contribute significantly to the transition into an era beyond 'Moore'. Lithographic methods are key technologies in the context of materials' integration into devices. However, to fully leverage the capabilities of these potential devices, it is vital to keep the integrity of the 2D materials intact and to minimize damage induced by device processing. This requirement is only partially met when employing conventional lithography methods, as they induce structural defects in the delicate materials. We demonstrate that exposing graphene to typical electron doses used in conventional electron beam

SUBMITTER: Weinhold M 

PROVIDER: S-EPMC9041141 | biostudies-literature | 2021 Sep

REPOSITORIES: biostudies-literature