Dataset Information

UV-protection from chitosan derivatized lignin multilayer thin film.

ABSTRACT: Lignin is one of the most abundant renewable materials on the earth. Despite possessing useful antioxidant and UV absorbing properties, its effective utilization in technology has been hampered by its relative insolubility and difficulty to process. In this work, a simple chemical derivatization process is utilized which yields water-soluble lignin possessing anionic carboxylate groups. These carboxylate groups give lignin polyanionic behavior and enable its utilization in the growth of a functional film via layer-by-layer (LbL) assembly with biologically sourced chitosan. The growth mechanism of this film is hypothesized to be a result of both hydrogen bonding and ionic interactions. The film demonstrates excellent UV-absorptive capability. A 100 nm thick chitosan/lignin coating was applied to a poly(3,4-ethylenedioxythiophene):poly(styrene sulfonate) film and shown to reduce its degradation sixfold over the course of a 1 hour exposure to harsh UV light. This is the first demonstration of lignin being utilized in a fully biologically derived LbL film. Utilization of lignin in LbL assembly is an important step in the development of renewable nanotechnology.

SUBMITTER: Kolibaba TJ

PROVIDER: S-EPMC9056636 | biostudies-literature | 2020 Sep

REPOSITORIES: biostudies-literature

ACCESS DATA

Publications

UV-protection from chitosan derivatized lignin multilayer thin film.

Kolibaba Thomas J TJ Stevens Daniel L DL Pangburn Stephen T ST Condassamy Olivia O Camus Martin M Grau Etienne E Grunlan Jaime C JC

RSC advances 20200904 54

Lignin is one of the most abundant renewable materials on the earth. Despite possessing useful antioxidant and UV absorbing properties, its effective utilization in technology has been hampered by its relative insolubility and difficulty to process. In this work, a simple chemical derivatization process is utilized which yields water-soluble lignin possessing anionic carboxylate groups. These carboxylate groups give lignin polyanionic behavior and enable its utilization in the growth of a functi ...[more]

PMID: 35516484

Similar Datasets

Project description:The key impact and significance of a multilayer polymer-based dielectric system on the remarkable photoresponse properties of zinc phthalocyanine (ZnPc)-based photosensitive organic field-effect transistors (PS-OFETs) have been systematically analyzed at various incident optical powers. A combination of inorganic aluminum oxide (Al2O3) and organic nonpolar poly(methyl methacrylate) (PMMA) is used as the bilayer dielectric configuration, whereas in the trilayer dielectric system, a bilayer polymer dielectric, consisting of PMMA, as the low-k dielectric polymer, on top of poly(vinyl alcohol) (PVA), the high-k polar dielectric, has been fabricated along with Al2O3 as the third layer. Before fabricating the OFETs, a systematic optimization of the nature of growth of the ZnPc molecules, deposited on PMMA-coated glass substrates at different substrate temperatures (T s) was performed and examined by atomic-force microscopy, field-emission scanning electron microscopy, X-ray diffraction, and Raman analysis. At 90 °C, the fabricated PS-OFETs with the Al2O3/PVA/PMMA trilayer dielectric configuration showed the best p-channel behavior, with an enhanced and remarkable photoresponsivity of R ∼ 9689.39 A W-1 compared to that of the Al2O3/PMMA bilayer dielectric system (R ∼ 2679.40 A W-1) due to the polarization of the dipoles inside the polar PVA dielectric, which increases the charge transport through the channel. The charge carrier mobility of the device also improved by one order (μh ∼ 1.3 × 10-2 cm2 V-1 s-1) compared to that of the bilayer dielectric configuration (μh ∼ 3.5 × 10-3 cm2 V-1 s-1). The observed specific detectivity (D*) and NEP values of the bilayer dielectric system were 6.01 × 1013 Jones and 2.655 × 10-17 W Hz-1/2, whereas for the trilayer dielectric system, the observed D* and NEP values were 5.13 × 1014 Jones and 1.043 × 10-17 W Hz-1/2, respectively. Additionally, the operating voltage of each of the fabricated devices was also very low (-10 V) due to the influence of the inorganic high-k Al2O3 dielectric layer. The electrical stability of all of the fabricated devices was also investigated by bias stress analysis under both light and dark conditions in vacuum. To the best of our knowledge, the photoresponsivity (R) reported here with an Al2O3/PVA/PMMA trilayer dielectric configuration is the highest reported value for thin film-based PS-OFETs, at a remarkably low operating voltage of -10 V, on low-cost glass substrates without indium tin oxide or/and Si/SiO2.

Dataset Information

UV-protection from chitosan derivatized lignin multilayer thin film.

Publications

UV-protection from chitosan derivatized lignin multilayer thin film.

Similar Datasets

OmicsDI is part of the ELIXIR infrastructure

Tweets