Super-resolution interference lithography enabled by non-equilibrium kinetics of photochromic monolayers.

ABSTRACT: Highly parallelized optical super-resolution lithography techniques are key for realizing bulk volume nanopatterning in materials. The majority of demonstrated STED-inspired lithography schemes are serial writing techniques. Here we use a recently developed model spirothiopyran monolayer photoresist to study the non-equilibrium kinetics of STED-inspired lithography systems to achieve large area interference lithography with super-resolved feature dimensions. The linewidth is predicted to increase with exposure time and the contrast is predicted to go through a maximum, resulting in a narrow window of optimum exposure. Experimental results are found to match with high quantitative accuracy. The low photoinhibition saturation threshold of the spirothiopyran renders it especially conducive fo

SUBMITTER: Vijayamohanan H 

PROVIDER: S-EPMC9071233 | biostudies-literature | 2019 Sep

REPOSITORIES: biostudies-literature