Formation of submicron-sized silica patterns on flexible polymer substrates based on vacuum ultraviolet photo-oxidation.

ABSTRACT: Formation of precise and high-resolution silica micropatterns on polymer substrates is of importance in surface structuring for flexible device fabrication of optics, microelectronic, and biotechnology. To achieve that, substrates modified with affinity-patterns serve as a strategy for site-selective deposition. In the present paper, vacuum ultraviolet (VUV) treatment is utilized to achieve spatially-controlled surface functionalization on a cyclo-olefin polymer (COP) substrate. An organosilane, 2,4,6,8-tetramethylcyclotetrasiloxane (TMCTS), preferentially deposits on the functionalized regions. Well-defined patterns of TMCTS are formed with a minimum feature of ∼500 nm. The secondary VUV/(O)-treatment converts TMCTS into SiO _x , meanwhile etches the bare COP surface, for

SUBMITTER: Wu CT 

PROVIDER: S-EPMC9072887 | biostudies-literature | 2019 Oct

REPOSITORIES: biostudies-literature