Effect of Fe ion implantation on the thermoelectric properties and electronic structures of CoSb₃ thin films.

ABSTRACT: In the present study, thin films of single-phase CoSb₃ were deposited onto Si(100) substrates via pulsed laser deposition (PLD) method using a polycrystalline target of CoSb₃. These films were implanted by 120 keV Fe-ions with three different fluences: 1 × 10¹⁵, 2.5 × 10¹⁵ and 5 × 10¹⁵ ions per cm². All films were characterised by X-ray diffraction (XRD), Raman spectroscopy, atomic force microscopy (AFM), Rutherford backscattering (RBS) spectrometry and X-ray absorption spectroscopy (XAS). XRD data revealed that the ion implantation decreased the crystalline nature of these films, which are recovered after the rapid thermal annealing process. The Seebeck coefficient S vary with the fluences in the temperature r

SUBMITTER: Masarrat A 

PROVIDER: S-EPMC9074955 | biostudies-literature | 2019 Nov

REPOSITORIES: biostudies-literature