Nanolithography using thermal stresses.

ABSTRACT: Nanometer separation (nanogap) in electrodes is a fundamental requirement for several nanoscale devices having applications in nanoelectronics, nanophotonics, biosensing, nanoporous filters, healthcare and medical diagnostics. Most nanolithography techniques, other than extreme/deep ultraviolet lithography are serial processes, such as e-beam lithography, and therefore not scalable. We demonstrate fabrication of nanogaps in Au electrodes over a large area/wafer in parallel processing mode resulting in high throughput. The proposed technique requires tools that are already available in a typical semiconductor device fabrication facility. The concept involves designing a ceramic/metal multilayer structure which is heated to bring the ceramic under tensile stress, and as a result it develops

SUBMITTER: Purohit G 

PROVIDER: S-EPMC9077770 | biostudies-literature | 2018 Jan

REPOSITORIES: biostudies-literature