Nanoridge patterns on polymeric film by a photodegradation copying method for metallic nanowire networks.

ABSTRACT: Topographical patterns are widely applied in many manufacturing areas due to the unique role in modifying performance related to physical, chemical and biological fundamentals. The patterns are usually realized by buckling or wrinkling, self-assembly or epitaxy, and lithography techniques. However, the combination of satisfactory controllability, ridge robustness, cost and dimensional precision is still difficult to achieve by any of the strategies above. A novel, simple and low-cost nanopatterning technique named "photodegradation copying method" with high technological flexibility has been initially proposed in this study. As a perfect example, a nanoridge-patterned surface has been successfully realized on a polymeric film thanks to the selective photodegradation of polymer and the shie

SUBMITTER: Wang J 

PROVIDER: S-EPMC9091417 | biostudies-literature | 2018 Dec

REPOSITORIES: biostudies-literature