Data on nitridation effect of AlTiTaZrHf(-N) high entropy films by X-ray photoelectron spectroscopy.

ABSTRACT: The data presented in this article are related to the published research of "Effect of nitrogen content on structural and mechanical properties of AlTiZrTaHf(-N) high entropy films deposited by reactive magnetron sputtering". This database contains X-ray photoelectron spectroscopy (XPS) measurements, performed in order to determine the extents of nitrides formed in AlTiTaZrHf high entropy films. The latter were prepared by DC magnetron sputtering technique in reactive mode by adding the nitrogen to argon gas. The nitrogen flow rate is calculated by R_N2 = N₂/(N₂+Ar). XPS measurements were done one month later. Oxides were detected on the top surface of the samples. 2p, 3d and 4f core level peaks were fitted in order to determine accurately the chemical compo

SUBMITTER: El Garah M 

PROVIDER: S-EPMC9114513 | biostudies-literature | 2022 Jun

REPOSITORIES: biostudies-literature