High-Throughput Direct Writing of Metallic Micro- and Nano-Structures by Focused Ga⁺ Beam Irradiation of Palladium Acetate Films.

ABSTRACT: Metallic nanopatterns are ubiquitous in applications that exploit the electrical conduction at the nanoscale, including interconnects, electrical nanocontacts, and small gaps between metallic pads. These metallic nanopatterns can be designed to show additional physical properties (optical transparency, plasmonic effects, ferromagnetism, superconductivity, heat evacuation, etc.). For these reasons, an intense search for novel lithography methods using uncomplicated processes represents a key on-going issue in the achievement of metallic nanopatterns with high resolution and high throughput. In this contribution, we introduce a simple methodology for the efficient decomposition of Pd₃(OAc)₆ spin-coated thin films by means of a focused Ga⁺ beam, which results

SUBMITTER: Salvador-Porroche A 

PROVIDER: S-EPMC9227716 | biostudies-literature | 2022 Jun

REPOSITORIES: biostudies-literature