Molecular Dynamics Study on Behavior of Resist Molecules in UV-Nanoimprint Lithography Filling Process.

ABSTRACT: In this study, we performed molecular dynamics (MD) simulations of the filling process of few-nanometer-wide trenches with various resist materials in ultraviolet nanoimprint lithography (UV-NIL) to identify the main molecular features necessary for a successful filling process. The 2- and 3-nm wide trenches were successfully filled with the resist materials that had (experimentally determined) viscosities less than 10 mPa·s. The resist composed of a three-armed bulky and highly viscous molecule could not fill the trenches. The radius of gyration of this molecule was smaller than half of the distance in which the first peak of its radial distribution function occurred. The available shapes of 1,6-hexanediol diacrylate (HDDA) and tri(propylene glycol) diacrylate (TPGDA), which are linear ph

SUBMITTER: Iwata J 

PROVIDER: S-EPMC9331815 | biostudies-literature | 2022 Jul

REPOSITORIES: biostudies-literature