Enhanced Electrical Properties of Copper Nitride Films Deposited via High Power Impulse Magnetron Sputtering.

ABSTRACT: High Power Impulse Magnetron Sputtering (HiPIMS) has generated a great deal of interest by offering significant advantages such as high target ionization rate, high plasma density, and the smooth surface of the sputtered films. This study discusses the deposition of copper nitride thin films via HiPIMS at different deposition pressures and then examines the impact of the deposition pressure on the structural and electrical properties of Cu₃N films. At low deposition pressure, Cu-rich Cu₃N films were obtained, which results in the n-type semiconductor behavior of the films. When the deposition pressure is increased to above 15 mtorr, Cu₃N phase forms, leading to a change in the conductivity type of the film from n-type to p-type. According to our analysis, t

SUBMITTER: Chen YH 

PROVIDER: S-EPMC9415204 | biostudies-literature | 2022 Aug

REPOSITORIES: biostudies-literature