Quantum dot photolithography using a quantum dot photoresist composed of an organic-inorganic hybrid coating layer.

ABSTRACT: Quantum dots (QDs) have emerged as an important class of materials for diverse applications such as solid-state lighting, energy conversion, displays, biomedicine, and plasmonics due to their excellent photonic properties and durability. Soft lithography, inkjet printing, nanoimprinting, and polymer deep-pen lithography are primary lithography techniques employed to implement micro-patterns with QDs, however, there are limited reports on QD photolithography using conventional photolithography processes suitable for mass production. This study reports a QD photolithography technique using a custom-developed QD photoresist made of an organic-inorganic hybrid coating layer. Using this QD photoresist, various QD micro-patterns, including red or green micro lines, RGB color filters for smartpho

SUBMITTER: Myeong S 

PROVIDER: S-EPMC9417674 | biostudies-literature | 2022 Feb

REPOSITORIES: biostudies-literature