Optical properties of plasmonic nanopore arrays prepared by electron beam and colloidal lithography.

ABSTRACT: Solid state nanopores are central structures for many applications. To date, much effort has been spent on controlled fabrication of single nanopores, while relatively little work has focused on large scale fabrication of arrays of nanopores. In this work we show wafer-scale fabrication of plasmonic nanopores in 50 nm thick silicon nitride membranes with one or two 30 nm gold films, using electron beam lithography with a negative resist or a new version of colloidal lithography. Both approaches offer good control of pore diameter (even below 100 nm) and with high yield (>90%) of intact membranes. Colloidal lithography has the advantage of parallel patterning without expensive equipment. Despite its serial nature, electron beam lithography provides high throughput and can make arbitrary arr

SUBMITTER: Malekian B 

PROVIDER: S-EPMC9418017 | biostudies-literature | 2019 Nov

REPOSITORIES: biostudies-literature